1、Designation:D554416Standard Test Method forOn-Line Measurement of Residue After Evaporation of High-Purity Water1This standard is issued under the fixed designation D5544;the number immediately following the designation indicates the year oforiginal adoption or,in the case of revision,the year of la
2、st revision.A number in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.1.Scope1.1 This test method covers the determination of dissolvedorganic and inorganic matter and colloidal material found inhigh-purity
3、 water used in the semiconductor,and relatedindustries.This material is referred to as residue after evapo-ration(RAE).The range of the test method is from 0.001 g/L(ppb)to 60 g/L(ppb).1.2 This test method uses a continuous,real time monitoringtechnique to measure the concentration of RAE.A pressuri
4、zedsample of high-purity water is supplied to the test methodsapparatus continuously through ultra-clean fittings and tubing.Contaminants from the atmosphere are therefore preventedfrom entering the sample.General information on the testmethod and a literature review on the continuous measurementof
5、RAE has been published.21.3 The values stated in SI units are to be regarded asstandard.The values given in parentheses are mathematicalconversions to inch-pound units that are provided for informa-tion only and are not considered standard.1.4 This standard does not purport to address all of thesafe
6、ty concerns,if any,associated with its use.It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.For specific hazardsstatements,see Section 8.2.Referenced Documents2.1 ASTM St
7、andards:3D1129 Terminology Relating to WaterD2777 Practice for Determination of Precision and Bias ofApplicable Test Methods of Committee D19 on WaterD3370 Practices for Sampling Water from Closed ConduitsD3864 Guide for On-Line Monitoring Systems for WaterAnalysisD3919 Practice for Measuring Trace
8、Elements in Water byGraphite Furnace Atomic Absorption SpectrophotometryD5127 Guide for Ultra-Pure Water Used in the Electronicsand Semiconductor IndustriesE1184 Practice for Determination of Elements by GraphiteFurnace Atomic Absorption Spectrometry3.Terminology3.1 DefinitionsFor definitions of ter
9、ms used in this testmethod,refer to Terminology D1129.3.2 Definitions of Terms Specific to This Standard:3.2.1 aerosol,nany solid or liquid particles,with a nomi-nal size range from 10 nm to 100 m,suspended in a gas(usually air).3.2.2 colloidal suspension,nany material in suspension(for example,sili
10、ca)with a nominal particle size less than 100nm.3.2.3 Water-based condensation particle counter(WCPC),ninstrument for detecting very small aerosol particles in asize range from approximately 7 nm to 2 to 3 m.3.2.3.1 DiscussionThe WCPC cannot differentiate amongparticles of varying size within this s
11、ize range;the counterreports the number of particles with a size greater than thatdefined by the detection-efficiency curve.Detection is indepen-dent of particle composition.3.2.4 detection effciency,nin this test method,detectionefficiency represents a curve relating particle size to a countersabil
12、ity to detect that size.3.2.5 polydisperse,adja type of size population,in thiscase of aerosol particles,composed of many different sizes;theopposite of monodisperse,which is a type of size distributionof just one size.3.2.6 realtime,nthe time that an event is occurring plusthe response time.1This t
13、est method is under the jurisdiction of ASTM Committee D19 on Waterand is the direct responsibility of Subcommittee D19.03 on Sampling Water andWater-Formed Deposits,Analysis of Water for Power Generation and Process Use,On-Line Water Analysis,and Surveillance of Water.Current edition approved June
14、1,2016.Published June 2016.Originallyapproved in 1994.Last previous edition approved in 2011 as D5544 11.DOI:10.1520/D5544-16.2Blackford,D.B.,“Use of Nonvolatile Residue Monitoring in SemiconductorWater Applications”Ultrapure Water Journal,Tall Oaks Publishing,November2008,pp.1623.3For referenced AS
15、TM standards,visit the ASTM website,www.astm.org,orcontact ASTM Customer Service at serviceastm.org.For Annual Book of ASTMStandards volume information,refer to the standards Document Summary page onthe ASTM website.Copyright ASTM International,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA
16、19428-2959.United States1 3.2.6.1 DiscussionIn this case,the response time is 3 to 5min,therefore,contamination is recorded 3 to 5 min after itoccurs.3.2.7 residue after evaporation,ncontaminants remainingafter all water is evaporated;sometimes known as nonvolatileresidue or total dissolved and suspended solids.4.Summary of Test Method4.1 This test method consists of continuously removing arepresentative sample of high-purity water from a pressurizedsupply line(refer to Practices D3370,Practice
