收藏 分享(赏)

ASTM_F_1192_-_11.pdf

上传人:益****师 文档编号:188153 上传时间:2023-03-04 格式:PDF 页数:11 大小:287.31KB
下载 相关 举报
ASTM_F_1192_-_11.pdf_第1页
第1页 / 共11页
ASTM_F_1192_-_11.pdf_第2页
第2页 / 共11页
ASTM_F_1192_-_11.pdf_第3页
第3页 / 共11页
ASTM_F_1192_-_11.pdf_第4页
第4页 / 共11页
ASTM_F_1192_-_11.pdf_第5页
第5页 / 共11页
ASTM_F_1192_-_11.pdf_第6页
第6页 / 共11页
亲,该文档总共11页,到这儿已超出免费预览范围,如果喜欢就下载吧!
资源描述

1、Designation:F119211Standard Guide for theMeasurement of Single Event Phenomena(SEP)Induced byHeavy Ion Irradiation of Semiconductor Devices1This standard is issued under the fixed designation F1192;the number immediately following the designation indicates the year oforiginal adoption or,in the case

2、 of revision,the year of last revision.A number in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.This standard has been approved for use by agencies of the U.S.Department of Defense.1.Scope1.1 This guide de

3、fines the requirements and procedures fortesting integrated circuits and other devices for the effects ofsingle event phenomena(SEP)induced by irradiation withheavy ions having an atomic number Z 2.This descriptionspecifically excludes the effects of neutrons,protons,and otherlighter particles that

4、may induce SEP via another mechanism.SEP includes any manifestation of upset induced by a singleion strike,including soft errors(one or more simultaneousreversible bit flips),hard errors(irreversible bit flips),latchup(persistent high conducting state),transients induced in com-binatorial devices wh

5、ich may introduce a soft error in nearbycircuits,power field effect transistor(FET)burn-out and gaterupture.This test may be considered to be destructive becauseit often involves the removal of device lids prior to irradiation.Bit flips are usually associated with digital devices and latchupis usual

6、ly confined to bulk complementary metal oxidesemiconductor,(CMOS)devices,but heavy ion induced SEPisalso observed in combinatorial logic programmable read onlymemory,(PROMs),and certain linear devices that may re-spond to a heavy ion induced charge transient.Power transis-tors may be tested by the p

7、rocedure called out in Method 1080of MIL STD 750.1.2 The procedures described here can be used to simulateand predict SEP arising from the natural space environment,including galactic cosmic rays,planetary trapped ions,andsolar flares.The techniques do not,however,simulate heavyion beam effects prop

8、osed for military programs.The endproduct of the test is a plot of the SEP cross section(thenumber of upsets per unit fluence)as a function of ion LET(linear energy transfer or ionization deposited along the ionspath through the semiconductor).This data can be combinedwith the systems heavy ion envi

9、ronment to estimate a systemupset rate.1.3 Although protons can cause SEP,they are not includedin this guide.A separate guide addressing proton induced SEPis being considered.1.4 The values stated in SI units are to be regarded asstandard.No other units of measurement are included in thisstandard.1.

10、5 This standard does not purport to address all of thesafety concerns,if any,associated with its use.It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2.Referenced Documen

11、ts2.1 Military Standard:2750 Method 10803.Terminology3.1 Definitions of Terms Specific to This Standard:3.1.1 DUTdevice under test.3.1.2 fluencethe flux integrated over time,expressed asions/cm2.3.1.3 fluxthe number of ions/s passing through a one cm2area perpendicular to the beam(ions/cm2-s).3.1.4

12、LETthe linear energy transfer,also known as thestopping power dE/dx,is the amount of energy deposited perunit length along the path of the incident ion,typicallynormalized by the target density and expressed as MeV-cm2/mg.3.1.4.1 DiscussionLET values are obtained by dividingthe energy per unit track

13、 length by the density of the irradiatedmedium.Since the energy lost along the track generateselectron-hole pairs,one can also express LET as chargedeposited per unit path length(for example,picocoulombs/micron)if it is known how much energy is required to generatean electron-hole pair in the irradi

14、ated material.(For silicon,3.62 eV is required per electron-hole pair.)Acorrection,important for lower energy ions in particular,is1This guide is under the jurisdiction of ASTM Committee F01 on Electronicsand is the direct responsibility of Subcommittee F01.11 on Nuclear and SpaceRadiation Effects.C

15、urrent edition approved Oct.1,2011.Published October 2011.Originallyapproved in 1988.Last previous edition approved in 2006 as F119200(2006).DOI:10.1520/F1192-11.2Available from Standardization Documents Order Desk,Bldg.4,Section D,700 Robbins Ave.,Philadelphia,PA 191115094.Copyright ASTM Internatio

16、nal,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA 19428-2959.United States1 made to allow for the loss of ion energy after it has penetratedoverlayers above the device sensitive volume.Thus the ionsenergy,E,at the sensitive volume is related to its initial energy,EO,as:Es5 Eo2*ot/cos!SdEx!dxDdxwhere t is the thickness of the overlayer and is the angleof the incident beam with respect to the surface normal.Theappropriate LET would thus correspond to the modifiedenergy,E.A very important

展开阅读全文
相关资源
猜你喜欢
相关搜索

当前位置:首页 > 专业资料 > 国外标准

copyright@ 2008-2023 wnwk.com网站版权所有

经营许可证编号:浙ICP备2024059924号-2