1、Designation:E303415Standard Guide forWorkforce Education in Nanotechnology PatternGeneration1This standard is issued under the fixed designation E3034;the number immediately following the designation indicates the year oforiginal adoption or,in the case of revision,the year of last revision.A number
2、 in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.1.Scope1.1 This guide provides a framework for a basic workforceeducationinpatterngenerationtopicsrelatedtonanotechnology,to be taught at an undergraduate c
3、ollege level.The education should be broadbased,preparing an individualto work in one of many areas in naotechnology research,development,or manufacturing.The individual so educatedmay be involved in nanoscale pattern definition.1.2 This guide may be used to develop or evaluate aneducation program f
4、or pattern generation topics in the nano-technology field.This guide provides listings of key topics thatshould be covered in a nanotechnology education program onthis subject,but it does not provide specific course material tobe used in such a program.This approach is taken in order toallow workfor
5、ce education entities to ensure their programscover the required material while also enabling these institu-tions to tailor their programs to meet the needs of their localemployers.1.3 While no units of measurements are used in thisstandard guide,values stated in SI units are to be regarded asstanda
6、rd.1.4 This standard does not purport to address all of themethods and concepts needed for pattern generation in nano-technology.It may not cover knowledge and skill objectivesapplicable to local conditions or required by local regulations.1.5 This standard does not purport to address all of thesafe
7、ty concerns,if any,associated with its use.It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.2.Referenced Documents2.1 ASTM Standards:2E2456 Terminology Relating to Nanote
8、chnologyE2996 Guide for Workforce Education in NanotechnologyHealth and SafetyE3001 Practice for Workforce Education in NanotechnologyCharacterization2.2 ISO Standards:3ISO/TS 80004-2 Nanotechnologies VocabularyPart 2:Nano-ObjectsISO/TS 80004-8 Nanotechnologies VocabularyPart 8:Nanomanufacturing Pro
9、cesses3.Terminology3.1 Definitions:3.1.1 For definitions of terms related to nanotechnology ingeneral,refer to Terminology E2456 and ISO/TS 80004-2.3.1.2 For definitions of terms related to nanotechnologypattern generation in general,refer to ISO/TS 80004-8.3.2 Definitions of Terms Specific to This
10、Standard:3.2.1 education,nthe teaching of specific topics as part ofa degree or certificate program,or as training to provideadditional skills and knowledge.3.2.2 pattern,na design or a layout for fabricated struc-tures.3.2.3 pattern generation,nthe technique(s)to create andtransfer a pattern onto a
11、 medium as applied in fabrication at themicro-or nanoscale;for example,photolithography is anoptical technique used in chip manufacturing for generating apattern on a substrate.4.Summary of Guide4.1 This guide designates a list of six topics on patterngeneration relevant to nanotechnology workforce
12、education.1This guide is under the jurisdiction of ASTM Committee E56 on Nanotech-nology and is the direct responsibility of Subcommittee E56.03 on Environment,Health,and Safety.Current edition approved Oct.15,2015.Published November 2015.DOI:10.1520/E3034-15.2For referenced ASTM standards,visit the
13、 ASTM website,www.astm.org,orcontact ASTM Customer Service at serviceastm.org.For Annual Book of ASTMStandards volume information,refer to the standards Document Summary page onthe ASTM website.3Available from International Organization for Standardization(ISO),ISOCentral Secretariat,BIBC II,Chemin
14、de Blandonnet 8,CP 401,1214 Vernier,Geneva,Switzerland,http:/www.iso.org.Copyright ASTM International,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA 19428-2959.United States1 Selection of the techniques,concepts,and materials are basedon inputs from industry,nanotechnology educators and subj
15、ectmatter experts.4.2 In this list,the first topic(8.1)pertains to the design ofthe patterns.The following five topics cover various lithogra-phy techniques.Three of the topics(8.2,8.3,and 8.5)covertechniques requiring physical masks to generate the patterns ona substrate.The other two topics(8.4 an
16、d 8.6)do not utilize anyphysical masks,but use either electronic design files(8.4)orengineering of the materials(8.6).5.Significance and Use5.1 The purpose of this guide is to provide a basic educa-tional structure for pattern generation in nanotechnology toorganizations developing or carrying out education programsfor the nanotechnology workforce.This guide helps to describethe minimum knowledge base for anyone involved in nano-manufacturing or nanomaterials research.5.2 The basic education sho
