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ASTM_F_2405_-_04_2011.pdf

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1、Designation:F240504(Reapproved 2011)Standard Test Method forTrace Metallic Impurities in High Purity Copper by High-Mass-Resolution Glow Discharge Mass Spectrometer1This standard is issued under the fixed designation F2405;the number immediately following the designation indicates the year oforigina

2、l adoption or,in the case of revision,the year of last revision.A number in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.1.Scope1.1 This test method covers the concentrations of tracemetallic impurities in

3、 high purity(99.95 wt.%pure,or purer,with respect to metallic trace impurities)electronic gradecopper.1.2 This test method pertains to analysis by magnetic-sectorglow discharge mass spectrometer(GDMS).1.3 This test method does not include all the informationneeded to complete GDMS analyses.Sophistic

4、ated computer-controlled laboratory equipment,skillfully used by an experi-enced operator,is required to achieve the required sensitivity.This test method does cover the particular factors(for example,specimen preparation,setting of relative sensitivity factors,determination of detection limits,and

5、the like)known by theresponsible technical committee to effect the reliability of highpurity copper analyses.1.4 This standard does not purport to address all of thesafety concerns,if any,associated with its use.It is theresponsibility of the user of this standard to establish appro-priate safety an

6、d health practices and determine the applica-bility of regulatory limitations prior to use.2.Referenced Documents2.1 ASTM Standards:2E135 Terminology Relating to Analytical Chemistry forMetals,Ores,and Related MaterialsE173 Practice for Conducting Interlaboratory Studies ofMethods for Chemical Analy

7、sis of Metals(Withdrawn1998)3E180 Practice for Determining the Precision of ASTMMethods for Analysis and Testing of Industrial and Spe-cialty Chemicals(Withdrawn 2009)3E691 Practice for Conducting an Interlaboratory Study toDetermine the Precision of a Test MethodE876 Practice for Use of Statistics

8、in the Evaluation ofSpectrometric Data(Withdrawn 2003)3F1593 Test Method for Trace Metallic Impurities in Elec-tronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer3.Terminology3.1 Terminology in this test method is consistent withTerminology E135.Required terminology specif

9、ic to this testmethod,not covered in Terminology E135,is indicated in 3.2.3.2 Definitions:3.2.1 campaigna test procedure to determine the accuracyof the instrument,which was normally performed at thebeginning of the day or after the instrument modification,orboth.3.2.2 reference samplematerial accep

10、ted as suitable foruse as a calibration/sensitivity reference standard by all partiesconcerned with the analyses.3.2.3 specimena suitably sized piece cut from a referenceor test sample,prepared for installation in the GDMS ionsource,and analyzed.3.2.4 test samplematerial(copper)to be analyzed for tr

11、acemetallic impurities by this GDMS method.3.2.4.1 DiscussionGenerally the test sample is extractedfrom a larger batch(lot,casting)of product and is intended tobe representative of the batch.4.Summary of Test Method4.1 A specimen is mounted in a plasma discharge cell.Atoms subsequently sputtered fro

12、m the specimen surface areionized,and then focused as an ion beam through a double-focusing magnetic-sector mass separation apparatus.The massspectrum(the ion current)is collected as magnetic field oracceleration voltage,or both,and is scanned.4.2 The ion current of an isotope at mass Miis the total

13、measured current,less contributions from all other interferingsources.Portions of the measured current may originate from1This test method is under the jurisdiction of ASTM Committee F01 onElectronics and is the direct responsibility of Subcommittee F01.17 on SputterMetallization.Current edition app

14、roved June 1,2011.Published June 2011.Originallyapproved in 2004.Last previous edition approved in 2004 as F240504.DOI:10.1520/F2405-04R11.2For referenced ASTM standards,visit the ASTM website,www.astm.org,orcontact ASTM Customer Service at serviceastm.org.For Annual Book of ASTMStandards volume inf

15、ormation,refer to the standards Document Summary page onthe ASTM website.3The last approved version of this historical standard is referenced onwww.astm.org.Copyright ASTM International,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA 19428-2959.United States1 the ion detector alone(detector n

16、oise).Portions may be due toincompletely mass resolved ions of an isotope or molecule withmass close to,but not identical with Mi.In all such instancesthe interfering contributions must be estimated and subtractedfrom the measured signal.4.2.1 If the source of interfering contributions to the mea-sured ion current at Micannot be determined unambiguously,the measured current less the interfering contributions fromidentified sources constitutes an upper bound of the detectionlimit for the current

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