1、Designation:E244411(Reapproved 2018)Standard Terminology Relating toMeasurements Taken on Thin,Reflecting Films1This standard is issued under the fixed designation E2444;the number immediately following the designation indicates the year oforiginal adoption or,in the case of revision,the year of las
2、t revision.A number in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.1.Scope1.1 This standard consists of terms and definitions pertain-ing to measurements taken on thin,reflecting films,such asfound in mic
3、roelectromechanical systems(MEMS)materials.In particular,the terms are related to the standards in Section 2,which were generated by Committee E08 on Fatigue andFracture.Terminology E1823 Relating to Fatigue and FractureTesting is applicable to this standard.1.2 The terms are listed in alphabetical
4、order.1.3 This international standard was developed in accor-dance with internationally recognized principles on standard-ization established in the Decision on Principles for theDevelopment of International Standards,Guides and Recom-mendations issued by the World Trade Organization TechnicalBarrie
5、rs to Trade(TBT)Committee.2.Referenced Documents2.1 ASTM Standards:2E1823 Terminology Relating to Fatigue and Fracture TestingE2244 Test Method for In-Plane Length Measurements ofThin,Reflecting Films Using an Optical InterferometerE2245 Test Method for Residual Strain Measurements ofThin,Reflecting
6、 Films Using an Optical InterferometerE2246 Test Method for Strain Gradient Measurements ofThin,Reflecting Films Using an Optical Interferometer3.Terminology3.1 Terms and Their Definitions:2-D data tracea two-dimensional group of points that isextracted from a topographical 3-D data set and that isp
7、arallel to the xz-or yz-plane of the interferometricmicroscope.E2244,E22453-D data seta three-dimensional group of points with atopographical z-value for each(x,y)pixel location within theinterferometric microscopes field of view.E2244,E2245,E2246anchorin a surface-micromachining process,the portion
8、 ofthe test structure where a structural layer is intentionallyattached to its underlying layer.E2244,E2245,E2246anchor lipin a surface-micromachining process,the free-standing extension of the structural layer of interest aroundthe edges of the anchor to its underlying layer.DISCUSSIONIn some proce
9、sses,the width of the anchor lip may bezero.E2244,E2245,E2246bulk micromachininga MEMS fabrication process wherethe substrate is removed at specified locations.E2244,E2245,E2246cantilevera test structure that consists of a freestandingbeam that is fixed at one end.E2244,E2245,E2246fixed-fixed beam a
10、 test structure that consists of a freestand-ing beam that is fixed at both ends.E2244,E2245in-plane length(or deflection)measurement,L(or D)Lthe experimental determination of the straight-linedistance between two transitional edges in a MEMS device.DISCUSSIONThis length(or deflection)measurement is
11、 made paral-lel to the underlying layer(or the xy-plane of the interferometricmicroscope).E2244,E2245,E2246interferometera non-contact optical instrument used toobtain topographical 3-D data sets.DISCUSSIONThe height of the sample is measured along the z-axisof the interferometer.The x-axis is typic
12、ally aligned parallel orperpendicular to the transitional edges to be measured.E2244,E2245,E2246MEMSmicroelectromechanical systems.E2244,E2245,E2246microelectromechanical systems,MEMSin general,thisterm is used to describe micron-scale structures,sensors,actuators,and technologies used for their man
13、ufacture(suchas,silicon process technologies),or combinations thereof.E2244,E2245,E2246residual strain,rin a MEMS process,the amount ofdeformation(or displacement)per unit length constrained1This test method is under the jurisdiction of ASTM Committee E08 on Fatigueand Fracture and is the direct res
14、ponsibility of Subcommittee E08.02 on Standardsand Terminology.Current edition approved May 1,2018.Published May 2018.Orginiallyapproved in 2005.Last previous edition approved in 2011 as E2444111.DOI:10.1520/E2444-11R18.2For referenced ASTM standards,visit the ASTM website,www.astm.org,orcontact AST
15、M Customer Service at serviceastm.org.For Annual Book of ASTMStandards volume information,refer to the standards Document Summary page onthe ASTM website.Copyright ASTM International,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA 19428-2959.United StatesThis international standard was develo
16、ped in accordance with internationally recognized principles on standardization established in the Decision on Principles for theDevelopment of International Standards,Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade(TBT)Committee.1 within the structural layer of interest after fabrication yetbefore the constraint of the sacrificial layer(or substrate)isremoved(in whole or in part)E2245,E2246sacrificial layera single thickness of material that is inte
