1、Designation:D143617Standard Test Methods forApplication of Emulsion Floor Polishes to Substrates forTesting Purposes1This standard is issued under the fixed designation D1436;the number immediately following the designation indicates the year oforiginal adoption or,in the case of revision,the year o
2、f last revision.A number in parentheses indicates the year of last reapproval.Asuperscript epsilon()indicates an editorial change since the last revision or reapproval.1.Scope1.1 These test methods cover procedures for application ofemulsion floor polish films to suitable substrates for testingpurpo
3、ses.Five test methods are covered,as outlined in Section3.1.2 These procedures are limited to use on flat,rigidsubstrates mounted,if necessary,on a nonabsorbent backing.1.3 The values stated in SI units are to be regarded as thestandard.The values given in parentheses are provided forinformation onl
4、y.1.4 This standard does not purport to address all of thesafety concerns,if any,associated with its use.It is theresponsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.1.5 This interna
5、tional standard was developed in accor-dance with internationally recognized principles on standard-ization established in the Decision on Principles for theDevelopment of International Standards,Guides and Recom-mendations issued by the World Trade Organization TechnicalBarriers to Trade(TBT)Commit
6、tee.2.Significance and Use2.1 All five of the test methods described will producepolish films from emulsion floor polishes which can be used forvarious performance tests.The choice of test method is left upto the individual laboratory.3.Choice of Test Method3.1 Under actual use conditions,the thickn
7、ess of the driedfilm deposited from water emulsion floor polishes ranges from0.03 mil to 0.4 mil.No one laboratory method has been foundthat will produce uniformly thick films throughout this rangeon all substrates.In many cases,the surface roughness andporosity of the substrate is of the same order
8、 of magnitude asthe thickness of the deposited films.Therefore,several alter-native methods have been developed.Unless otherwisespecified,the choice of method of application and substrateshall be mutually agreed upon by the purchaser and the seller.The characteristics of the five methods are as foll
9、ows:3.1.1 Method A.Automatic Dip CoaterThis method pro-duces thin films of excellent uniformity on the first coat withsubstrates of low or moderate porosity.Two-or three-coatapplications may produce partial solubility of the earlier coatswith consequent loss of uniformity.3.1.2 Method B.Hand Applica
10、torThis method simulatesuse conditions and produces thin films of satisfactory unifor-mity for many test purposes where the area of the test panel issmall(304.8 by 304.8 mm(12 by 12 in.)or smaller).With largepanels,considerable local nonuniformity of film thickness mayresult.3.1.3 Method C.Manual Di
11、p MethodThis method resultsin wedge-shaped films,of moderate thickness,that are thickerat the bottom than at the top of the panel.This method is rapidand results in reproducible films in the center of the test panelwhich are useful for comparison tests and for tests involvingthe surface properties o
12、f the wax film.3.1.4 Method D.Blade ApplicatorThis method merelyspreads a known volume of emulsion over a known surfacearea.The uniformity of the resulting film depends on theflatness of the substrate,the surface tension of the emulsion,and the interfacial tension between the emulsion and thesubstra
13、te.The method is satisfactory for producing thick tomoderately thin films.Some practice and familiarity with themethod are necessary to produce uniform thin films.3.1.5 Method E.Pour SurfaceThis method covers pouringa small amount of polish over a tile held at a 45 angle andallowing it to flow unifo
14、rmly down the tile and coating it.Afterthe polish is poured and the bottom bead forms,it is wiped offand allowed to dry.The method is satisfactory for producingthick films for slip resistance testing.4.Standard Conditions4.1 The materials and apparatus shall be permitted to cometo equilibrium in an
15、atmosphere having a relative humidity of50 6 4%and a temperature of 23.8 6 1.1C(75 6 2F).1These test methods are under the jurisdiction of ASTM Committee D21 onPolishes and are the direct responsibility of Subcommittee D21.04 on PerformanceTests.Current edition approved March 1,2017.Published April
16、2017.Originallyapproved in 1956.Last previous edition approved in 2015 as D1436 97(2015).DOI:10.1520/D1436-17.Copyright ASTM International,100 Barr Harbor Drive,PO Box C700,West Conshohocken,PA 19428-2959.United StatesThis international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for theDevelopment of International Standards,Guides and Recommendations issued by the World Trade Organization Technical
